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Wafer Grinder and CMP Tools   2

ID: N0017325QMB04 • Type: Synopsis Solicitation

Description

Posted: Jan. 31, 2025, 10:59 a.m. EST

See attached combined Synopsis/Solicitation and System Specifications.

Note; The Government is accepting offers for both new and refurbished hardware. Contractors response needs to specify whether proposing new or refurbished.

Amendment #1 extends the due date for receipt of offers from 2/7/2025 to 2/14/2025

Amendment #2 responds to a question and posts a revised combined Synopsis/Solicitation changing the due date for offers to 2/14/2025.

Q. Regarding the RFQ for grind and CMP tools for Silicon Carbide does the NRL intend to provide wafers for potential contractors to perform demonstrations, or are you just looking for data from previous demonstrations?

R. NRL will provide wafers for potential contractors to perform the demonstrations.

Amendment # 3 respond to following questions:

Q. Is NRL looking for automated functions or semi-automatic? Is the purpose for R&D or production?

A. Semi-automatic functions are acceptable. The purpose of the tools is for R&D.

Q. Few machines automatically move from coarse grind to fine grind. Does NRL require high production or are they looking to do

wafers one at a time?

A. One wafer at a time.

Amendment #4 Respond to questions;

For bonded wafers, what is the incoming total wafer stack thickness?
Our standard thickness gauge can measure up to 1,800um. If the wafer it thicker than that, we can upgrade to 2.7mm IPG.

A. The total wafer stack thickness will be approx. 700 750 um

  1. SiC wafers have Si plane and C plane. If you could confirm which side to grind/polish,
  2. Which plane (Si or C plane) will you polish?

In answer to 1 and 2 above with regard to single SiC wafers:

  1. For single SiC wafers, the Si- and/or C-planes will need to be ground and/or polished in order to achieve the bow and TTV specs

b) For bonded SiC/SiO2/Si stacks, the C-face of the SiC wafer will be ground and polished

c) For bonded SiC/SiO2/SiC stacks, the exterior faces will be C-plane and at least one face will need to be ground and polished. The other SiC surface may need to be ground/polished in order to meet the bow and TTV specs

  1. Are wafers single crystal or polycrystal?

Single crystal

Just for confirmation a multi-stage filtration system shall filter particles up to 0.1 m in the waste water from the grinding tool at flow rates up to 12 gpm " in the Specifications => This is waste water from the grinder, correct?

Yes, correct, the waste water is from the grinder

Posted: Jan. 30, 2025, 9:39 a.m. EST
Posted: Jan. 28, 2025, 8:22 a.m. EST
Posted: Jan. 23, 2025, 3:44 p.m. EST
Posted: Jan. 23, 2025, 8:16 a.m. EST
Background
The Naval Research Laboratory (NRL) is seeking to procure Wafer Grinder and Chemical Mechanical Polisher (CMP) Tools. This solicitation is part of their mission to support semiconductor manufacturing capabilities. The goal of the contract is to acquire commercially available tools that can effectively process semiconductor substrates.

Work Details
The required equipment includes:
- Wafer Grinder: Must remove up to 345 µm of semiconductor substrates from bonded or unbonded wafers, supporting wafer diameters between 75 mm and 150 mm. It should apply differential pressure across the substrate for low total thickness variation (TTV). Automatic grinding processes are needed for both coarse and fine grinding, with feedback controls for thickness measurement.

- Chemical Mechanical Polisher (CMP): Must provide consistent results from wafer-to-wafer and batch-to-batch, achieving low surface roughness (< 5 Å) after polishing. Contractors must specify whether they are offering new or refurbished equipment, as gray market items are not acceptable.

Period of Performance
Equipment delivery shall be no later than 6 months from the date of award.

Place of Performance
Naval Research Laboratory, 45555 Overlook Ave., SW, Washington, DC 20375

Overview

Response Deadline
Feb. 14, 2025, 12:00 p.m. EST (original: Feb. 7, 2025, 12:00 p.m. EST) Past Due
Posted
Jan. 23, 2025, 8:16 a.m. EST (updated: Jan. 31, 2025, 10:59 a.m. EST)
Set Aside
Small Business (SBA)
Place of Performance
Washington, DC 20375 United States
Source
SAM

Current SBA Size Standard
1500 Employees
Pricing
Likely Fixed Price
Est. Level of Competition
Low
Signs of Shaping
79% of obligations for similar contracts within the Department of the Navy were awarded full & open.
On 1/23/25 Naval Research Laboratory issued Synopsis Solicitation N0017325QMB04 for Wafer Grinder and CMP Tools due 2/14/25. The opportunity was issued with a Small Business (SBA) set aside with NAICS 333242 (SBA Size Standard 1500 Employees) and PSC 3670.
Primary Contact
Name
Michael Broomfield   Profile
Phone
(202) 875-9785

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Additional Details

Source Agency Hierarchy
DEPT OF DEFENSE > DEPT OF THE NAVY > ONR > ONR NRL > NAVAL RESEARCH LABORATORY
FPDS Organization Code
1700-N00173
Source Organization Code
100255323
Last Updated
March 1, 2025
Last Updated By
michael.broomfield@nrl.navy.mil
Archive Date
March 1, 2025